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Title:
積層体フィルムと電極基板フィルムおよびこれ等の製造方法
Document Type and Number:
Japanese Patent JP6597621
Kind Code:
B2
Abstract:
[Solving Means] An electrode substrate film with a transparent substrate 52 and a metal laminate thin line includes a metal absorption layer 51 with a film thickness of 20 nm to 30 nm inclusive as a first layer, and a metal layer 50 as a second layer, counted from the transparent substrate side, the laminate thin line having a line width of 20 μm or less. Optical constants of the metal absorption layer in a visible wavelength range (400 to 780 nm) satisfy conditions that a refractive index is 2.0 to 2.2 and an extinction coefficient is 1.8 to 2.1 at a wavelength of 400 nm, the refractive index is 2.4 to 2.7 and the extinction coefficient is 1.9 to 2.3 at a wavelength of 500 nm, the refractive index is 2.8 to 3.2 and the extinction coefficient is 1.9 to 2.5 at a wavelength of 600 nm, the refractive index is 3.2 to 3.6 and the extinction coefficient is 1.7 to 2.5 at a wavelength of 700 nm, and the refractive index is 3.5 to 3.8 and the extinction coefficient is 1.5 to 2.4 at a wavelength of 780 nm. An average reflectance in the visible wavelength range attributed to reflection at an interface between the transparent substrate and the metal absorption layer is 20% or less, and a difference between a highest reflectance and a lowest reflectance in the visible wavelength range is 10% or less.

Inventors:
Hideharu Ogami
Application Number:
JP2016545536A
Publication Date:
October 30, 2019
Filing Date:
August 25, 2015
Export Citation:
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Assignee:
Sumitomo Metal Mining Co., Ltd.
International Classes:
G06F3/041; B32B15/08; G06F3/044; H01B5/14; H01B13/00
Domestic Patent References:
JP2014513335A
Attorney, Agent or Firm:
Akira Ueda
Masahiro Koizumi