Title:
端正な断面を有する大面積低質量のIRピクセル
Document Type and Number:
Japanese Patent JP4700196
Kind Code:
B2
Abstract:
The present invention provides a much more optimum design for an infrared pixel microstructure. The configuration of the microstructure itself is designed to optimum operational characteristics including faster speeds than previously available. These faster speeds are achieved by reducing the thermal mass of the pixel itself, thus directly affecting the pixels associated thermal time constant. Thermal mass is reduced by tailoring the cross section of the pixel structure such that protective layers are substantially reduced in areas where they are not necessary. This results in the desired reduction and overall pixel mass and consequently more optimum pixel performance.
Inventors:
Cowl, Barrett E
Higashi, Robert Y
Higashi, Robert Y
Application Number:
JP2000609770A
Publication Date:
June 15, 2011
Filing Date:
March 10, 2000
Export Citation:
Assignee:
Honeywell International Inc.
International Classes:
G01J1/02; G01J5/48; H01L27/14; H01L27/146; H01L37/02; H04N5/33
Domestic Patent References:
| JP5206526A | ||||
| JP7190854A | ||||
| JP8285680A |
Attorney, Agent or Firm:
Kazuo Shamoto
Shosuke Imai
Tadashi Masui
Yasushi Kobayashi
Hiroyuki Tomita
Fujihiro Kanda
Shosuke Imai
Tadashi Masui
Yasushi Kobayashi
Hiroyuki Tomita
Fujihiro Kanda