Title:
LASER EXCITATION PROCESS APPARATUS
Document Type and Number:
Japanese Patent JPS6077413
Kind Code:
A
Abstract:
PURPOSE:To raise reaction speed and significantly improve a film forming speed or etching speed by providing a grid to the laser irradiation part and giving an acceleration voltage to the ion. CONSTITUTION:The laser beam 12 generated by the light source 11 is guided to the reaction chamber 1 through the lens system 13. An ion acceleration grid 14 is provided surrounding the beam path and the side opposite to the substrate 9 is opened. An acceleration voltage up to 50eV is applied by the grid to the ion generated by the laser beam. Thereby the ions are all caused to reach the substrate 9, and other molecules are ionized during such process and moreover, reaction coefficient is increased through promoted reaction at the surface of substrate. The acceleration voltage is set to about 50eV in order to prevent damage of substrate 9. According to this constitution, the laser excitation process can be put into practical use.
Inventors:
HAYASHI TOSHIO
Application Number:
JP18448283A
Publication Date:
May 02, 1985
Filing Date:
October 04, 1983
Export Citation:
Assignee:
ULVAC CORP
International Classes:
H01L21/205; H01L21/302; H01L21/31; (IPC1-7): H01L21/302; H01L21/31
Domestic Patent References:
| JPS5689835A | 1981-07-21 | |||
| JPS5368171A | 1978-06-17 | |||
| JP59192833B |
Attorney, Agent or Firm:
Shigeru Yagita