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Patent Searching and Data


Title:
LASER EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2011091177
Kind Code:
A
Abstract:

To perform uniform exposure by making uniform interference fringes of laser light formed through a fly-eye lens and reducing illuminance unevenness of the laser light.

A laser exposure device includes: a laser light source 1; a first fly-eye lens 2 which makes the uniform intensity distribution of light in a surface to be orthogonally crossed with an optical axis 9, and enlarges the cross section shape of the laser light by radially releasing emission light after concentrating the light once; a first condenser lens 4 for making laser light with the cross section shape enlarged therein into parallel light; a second fly-eye lens 5 for making an uniform light intensity distribution in an illumination region of a photomask 12 which is irradiated with the laser light; a diffuser panel 3 arranged between the first fly-eye lens 2 and the first condenser lens 4, so as to diffuse the laser light; and a transparent rotary plate 6 arranged on the laser light emission side of the second fly-eye lens 5, having a face 6a inclined with respect to the optical axis 9, and rotating with the optical axis 9 as a center.


Inventors:
HATANAKA MAKOTO
Application Number:
JP2009242948A
Publication Date:
May 06, 2011
Filing Date:
October 22, 2009
Export Citation:
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Assignee:
V TECHNOLOGY CO LTD
International Classes:
H01L21/027; B23K26/073; G02B3/00; G02B5/02; G02B19/00; G03F7/20
Domestic Patent References:
JPH088168A1996-01-12
JP2000223405A2000-08-11
JP2006064380A2006-03-09
JPH03180019A1991-08-06
JPH0684759A1994-03-25
JP2002100561A2002-04-05
JP2005258306A2005-09-22
JP2005317672A2005-11-10
JP2009182191A2009-08-13
Foreign References:
WO2006070580A12006-07-06
Attorney, Agent or Firm:
Tomijio Sasashima