Title:
レーザガスリサイクルシステムおよびその方法
Document Type and Number:
Japanese Patent JP6670869
Kind Code:
B2
Abstract:
To provide a laser gas recycle system and a method for the same capable of obtaining a refined gas in which predetermined impurities are removed from an exhaust gas exhausted from an excimer laser oscillation device.SOLUTION: A laser gas recycle system 1 for obtaining a refined gas whose main component is a high purity neon gas by removing predetermined impurities from an exhaust gas exhausted from an excimer laser oscillation device or the oscillation chamber of an excimer laser comprises: a separation membrane device 110 membrane-separating a rare gas for excitation except neon from a gas to be treated; and an impurity removal device 120 removing the predetermined impurities from a treated gas permeated (or non-permeated) in the separation membrane device 110.SELECTED DRAWING: Figure 1
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Inventors:
Suzuki Kiyoka
Terumasa Koura
Fumikazu Nozawa
Terumasa Koura
Fumikazu Nozawa
Application Number:
JP2018025815A
Publication Date:
March 25, 2020
Filing Date:
February 16, 2018
Export Citation:
Assignee:
Air Liquide Japan Ltd.
International Classes:
B01D53/75; B01D53/00; B01D53/22; B01D61/58; C01B23/00; H01S3/036; H01S3/225
Domestic Patent References:
| JP2008137847A | ||||
| JP2017080710A | ||||
| JP2003068629A | ||||
| JP2002097007A |
Attorney, Agent or Firm:
Patent Business Corporation Unias International Patent Office