Title:
プレパルスによるレーザ生成プラズマEUV光源
Document Type and Number:
Japanese Patent JP5431675
Kind Code:
B2
Abstract:
A method for generating EUV light is disclosed which may include the acts/steps of providing a source material; generating a plurality of source material droplets; simultaneously irradiating a plurality of source material droplets with a first light pulse to create irradiated source material; and thereafter exposing the irradiated source material to a second light pulse to generate EUV light, e.g. by generating a plasma of the source material. In another aspect, an EUV light source may include a droplet generator delivering a plurality of source material droplets to a target volume; a source of a first light pulse for simultaneously irradiating a plurality of droplets in the target volume to produce an irradiated source material; and a source of a second light pulse for exposing the irradiated source material to generate EUV light. The droplet generator may comprise a non-modulating droplet generator and may comprise a multi-orifice nozzle.
Inventors:
Vikanov Alexander N
Codykin Olly
Codykin Olly
Application Number:
JP2007557224A
Publication Date:
March 05, 2014
Filing Date:
February 24, 2006
Export Citation:
Assignee:
Cymer Incorporated
International Classes:
H01L21/027; H05G2/00
Domestic Patent References:
| JP2004247293A | ||||
| JP2006216801A |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda