Title:
LASER IRRADIATION DEVICE, LASER IRRADIATION METHOD AND PROJECTION MASK
Document Type and Number:
Japanese Patent JP2019102621
Kind Code:
A
Abstract:
To provide a laser irradiation device and a laser irradiation method and a projection mask which are arranged to be able to suppress the variation in property between a plurality of thin-film transistors included in a substrate.SOLUTION: A laser irradiation device according to an embodiment of the present invention comprises: a light source for generating a laser beam; a projection lens for applying the laser beam to a predetermined region of a substrate moving in a predetermined direction; and a projection mask provided on the projection lens, in which a plurality of openings are arrayed at least in a line along the predetermined direction. The projection lens is arranged so as to apply the laser beam to a predetermined region through each opening more than once. A transmittance which is a rate of the laser beam passing through the opening assigned a given ordinal number or subsequent one when counted from the first opening of the plurality of openings is set to a value equal to or smaller than a predetermined value, provided that the laser beam first applied to the predetermined region passes through the first opening.SELECTED DRAWING: Figure 6
Inventors:
MIZUMURA MICHINOBU
Application Number:
JP2017231064A
Publication Date:
June 24, 2019
Filing Date:
November 30, 2017
Export Citation:
Assignee:
V TECH CO LTD
International Classes:
H01L21/268; H01L21/20; H01L21/336; H01L29/786
Attorney, Agent or Firm:
Shirasaka Patent Office