Title:
レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法
Document Type and Number:
Japanese Patent JP4397571
Kind Code:
B2
Abstract:
The present invention is characterized in that by laser beam being slantly incident to the convex lens, an aberration such as astigmatism or the like is occurred, and the shape of the laser beam is made linear on the irradiation surface or in its neighborhood. Since the present invention has a very simple configuration, the optical adjustment is easier, and the device becomes compact in size. Furthermore, since the beam is slantly incident with respect to the irradiated body, the return beam can be prevented.
Inventors:
Koichiro Tanaka
Hidekazu Miyairi
Aiko Shiga
Akihisa Shimomura
Atsushi Isobe
Hidekazu Miyairi
Aiko Shiga
Akihisa Shimomura
Atsushi Isobe
Application Number:
JP2002256189A
Publication Date:
January 13, 2010
Filing Date:
August 30, 2002
Export Citation:
Assignee:
Semiconductor Energy Laboratory Co., Ltd.
International Classes:
H01L21/20; H01L21/268; B23K26/073; H01L21/265; H01L21/336; H01L21/77; H01L21/84; H01L29/786; H01S3/00; H01S3/10
Domestic Patent References:
| JP1173707A | ||||
| JP2000269161A | ||||
| JP9260302A | ||||
| JP63138991U |
Foreign References:
| US5669979 |