PURPOSE: To make it possible to reproduce such a condition close to an actual pattern simulatingly by a method wherein a length measuring monitor formed on scribing lines and is provided with a plurality of lines corresponding to the actual pattern and are arranged in parallel to each other, is used.

CONSTITUTION: A length measuring monitor is an Al monitor 12A, which is formed on scribing lines 14 provided between LST formation regions 15 provided on a wafer and consists of an Al layer with five lines, which have the smallest line width and are arranged in parallel to each other on the Al layer. In such a way, as the length measuring monitor provided with the five lines which have the smallest line width and are arranged in parallel to each other, is used in place of a conventional monitor with a single line arranged on a scribing line, such a condition close to an actual pattern as a multitude of wirings are arranged in parallel to each other can be set in a simulating manner in a memory cell, for example.