Title:
LIGHT SOURCE-ADJUSTING METHOD, EXPOSURE METHOD, AND DEVICE-MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2015172750
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an optimization method of an illumination light source shape for forming a pattern on an object.SOLUTION: An optimization method of an illumination light source shape comprises: steps 202 to 212 of obtaining the light source shape as a target, as a result of SMO [Source and Mask Optimization] (SMO solution) being a method of optimization calculation optimizing a pattern of a mask and an illumination light source, controlling a spatial light modulator such that deviations from the target fall in an allowable range and setting the illumination light source shape (light source shape); steps 220 and 222 of forming an image of the pattern obtained as the result of SMO (SMO solution) by using illumination light from the illumination light source having the light source shape set, on a wafer, and evaluating OPE (Optical Proximity Effect) as imaging performance by using a detection result (line width error) of detection of the image of the formed pattern as an evaluation index; and steps 222 and 218 of optimizing the light source shape on the basis of an evaluation result of the OPE.
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Inventors:
MATSUYAMA TOMOYUKI
KITA HISANORI
KITA HISANORI
Application Number:
JP2015077395A
Publication Date:
October 01, 2015
Filing Date:
April 06, 2015
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20
Domestic Patent References:
| JP2009117801A | 2009-05-28 | |||
| JP2007142215A | 2007-06-07 | |||
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Attorney, Agent or Firm:
Atsushi Tateishi