Title:
照明装置及び照明方法
Document Type and Number:
Japanese Patent JP5086567
Kind Code:
B2
Abstract:
There is provided a lighting system having a high spatial resolution appropriate to a high-frequency component by evanescent waves in a negative refraction lens. The lighting system includes a light emitter thin film (106) which includes a light emitting material which emits light when an energy is applied, a cathode (101) for applying an electron beam (102) which is the energy, to the light emitter thin film (106), and a negative refraction lens (110) which is formed of a material exhibiting negative refraction, and has an optical system for projecting light emitted from the light emitter thin film (106), on an object.
Inventors:
Hiroya Fukuyama
Application Number:
JP2006174447A
Publication Date:
November 28, 2012
Filing Date:
June 23, 2006
Export Citation:
Assignee:
Olympus Endo Technology America Inc.
International Classes:
H01J63/06
Domestic Patent References:
JP6079110B2 | ||||
JP2006112985A | ||||
JP2003149119A | ||||
JP5088165A | ||||
JP2006072237A | ||||
JP2006049904A | ||||
JP2004227822A | ||||
JP2006040835A | ||||
JP2002296117A | ||||
JP2000208089A | ||||
JP8031303A | ||||
JP4312752A | ||||
JP63252350A | ||||
JP2005222943A | ||||
JP2000081484A | ||||
JP2006066378A |
Foreign References:
WO1993006616A1 |
Attorney, Agent or Firm:
Keisuke Saito