To provide a reflective lighting technology that reduces an adhesion amount of particulates such as debris to the reflective surface.
A lighting optical device for illuminating a surface being irradiated with exposure light EL includes a lighting optical system ILS having a curved mirror 24 and a concave surface mirror 25 and forming a position substantially conjugate to the surface being irradiated between the curved mirror 24 and the concave surface mirror 25, and a second aperture board 5 separating a space B with the curved mirror 24 and a space C with the concave surface mirror 25 to different vacuum environments or decompression environments, and having an opening 5a through which the exposure light EL passes, wherein the opening 5a is arranged at a position where the cross section of the exposure light EL is smallest or in the vicinity thereof. The quantity of passing particulates such as debris can be reduced for the subsequent optical system.
JP2001110709A | 2001-04-20 | |||
JP2006049815A | 2006-02-16 | |||
JP2006024849A | 2006-01-26 | |||
JP2006310520A | 2006-11-09 | |||
JP2007179881A | 2007-07-12 | |||
JP2006024849A | 2006-01-26 | |||
JP2006310520A | 2006-11-09 | |||
JP2007179881A | 2007-07-12 |