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Title:
LIGHTING OPTICAL DEVICE, EXPOSURE EQUIPMENT, AND PROCESS FOR FABRICATING DEVICE
Document Type and Number:
Japanese Patent JP2009044146
Kind Code:
A
Abstract:

To obtain a lighting optical device which can avoid adverse effect of field stop on the image formation and aggravation of light exposure distribution when the lighting optical device is applied to exposure equipment employing a reflective original, for example.

The lighting optical device comprises a lighting optical system having a plurality of reflectors arranged to guide a lighting beam to an irradiated surface, a first partial field stop (21) arranged in the optical path of the lighting optical system and defining the first outer edge of a lighting region to be formed on the irradiated surface (M), and a second partial field stop (22) arranged between the lighting optical system and the irradiated surface and defining the second outer edge of the lighting region. The lighting optical system has relay optical systems (19a, 19b) for making the positions of first and second field stops substantially conjugate optically.


Inventors:
KOMATSUDA HIDEKI
Application Number:
JP2008185999A
Publication Date:
February 26, 2009
Filing Date:
July 17, 2008
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B17/08; G02B19/00; G03F7/20
Domestic Patent References:
JP2000091220A2000-03-31
JP2004140390A2004-05-13
JP2006049815A2006-02-16
JP2007095767A2007-04-12
JP2005093692A2005-04-07
Foreign References:
US6452661B12002-09-17
Attorney, Agent or Firm:
Takao Yamaguchi