Title:
LIGHTING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2010062309
Kind Code:
A
Abstract:
To suppress the generation of irregularity in an illuminance on an irradiating face, and a change of a polarizing state caused by influences of a stress double refraction inside a lens.
The lighting optical system which lights the irradiating face by a light from a light source includes: first fresnel lens faces (11a and 11b) and second fresnel lens faces (12a and 12b) arranged in an optical path. The lighting optical system is configured in such a way that a position of a step of the first fresnel lens faces is not overlapped with a position of a step of the second fresnel lens faces when viewing from an optical axis (AX) direction of the lighting optical system.
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Inventors:
MURAMATSU KOJI
Application Number:
JP2008226089A
Publication Date:
March 18, 2010
Filing Date:
September 03, 2008
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Takao Yamaguchi
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