Title:
光剤を用いた限界寸法制御
Document Type and Number:
Japanese Patent JP6750155
Kind Code:
B2
Abstract:
A method for critical dimension control in which a substrate is received having an underlying layer and a patterned layer formed on the underlying layer, the patterned layer including radiation-sensitive material and a pattern of varying elevation with a first critical dimension. The method further includes applying an overcoat layer over the patterned layer, the overcoat layer containing a photo agent selected from a photosensitizer generator compound, a photosensitizer compound, a photoacid generator compound, a photoactive agent, an acid-containing compound, or a combination of two or more thereof. The overcoat layer is then exposed to electromagnetic radiation, wherein the dose of electromagnetic radiation incident upon different exposed regions of the substrate is varied, and then the overcoat layer and patterned layer are heated. The method further includes developing the overcoat layer and the patterned layer to alter the first critical dimension of the patterned layer to a second critical dimension.
Inventors:
Devilliers, Anton, Jay.
Carcassi, Michael, A.
Carcassi, Michael, A.
Application Number:
JP2018559865A
Publication Date:
September 02, 2020
Filing Date:
May 12, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; G03F7/20; G03F7/40
Domestic Patent References:
| JP2002006512A | ||||
| JP2000035672A | ||||
| JP2015508574A |
Foreign References:
| WO2015069658A1 | ||||
| WO2015069646A1 | ||||
| WO2016007303A1 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki
Tadahiko Ito
Shinsuke Onuki