Title:
LINE PATTERN PROJECTOR USED IN THREE-DIMENSIONAL DISTANCE MEASUREMENT SYSTEM
Document Type and Number:
Japanese Patent JP2023004973
Kind Code:
A
Abstract:
To provide a pattern projector with which it is possible to provide a high output illumination pattern and a significant amount of projection distance.SOLUTION: A line pattern projector includes a light source array, a lens, and a diffraction microlens array. The light source array includes a plurality of light sources that emit light beams, the plurality of light sources being arrayed along a first direction. The lens is constructed so as to collimate the light beams. The diffraction microlens array (MLA) is constructed so as to diffract the collimated light beams and thereby project an illumination pattern, the lens pitch of the diffraction MLA that pertains to the first direction being wider than the lens pitch of the diffraction MLA that pertains to a second direction. The illumination pattern is formed by superimposing a plurality of dot patterns one on top of another that are projected by the light sources, the illumination pattern including a plurality of line light patterns in the first direction.SELECTED DRAWING: Figure 3
Inventors:
HSIAO MING-SHU
Application Number:
JP2022101698A
Publication Date:
January 17, 2023
Filing Date:
June 24, 2022
Export Citation:
Assignee:
HIMAX OPTELECTRONICS CORP
International Classes:
G01B11/00; G02B3/00; G02B5/00; G02B5/18; G03B21/00
Domestic Patent References:
| JP2019113530A | 2019-07-11 |
Foreign References:
| CN108227231A | 2018-06-29 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Osamu Miyazaki
Tadahiko Ito
Osamu Miyazaki