Title:
LIQUID CHEMICAL SUPPLY DEVICE AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2017126617
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a liquid chemical supply device arranged so that the inside of the device can be cleaned rapidly and safely.SOLUTION: A liquid chemical supply device 10 comprises: a housing 11; a liquid chemical supplying pipe 12 provided to extend through the housing 11; a first valve 13 provided on the liquid chemical supplying pipe 12, and operated by supply of fluid or electricity from the outside; and a second valve 14 provided upstream from the first valve 13 in the liquid chemical supplying pipe 12 and having a joint part 14a and a handle 14b. The first valve 13 and the joint part 14a of the second valve 14 are housed in the housing 11. The handle 14b of the second valve 14 is disposed outside the housing 11.SELECTED DRAWING: Figure 1
Inventors:
SUEMASA SHUICHI
SHINOZAKI HIROYUKI
SHINOZAKI HIROYUKI
Application Number:
JP2016003870A
Publication Date:
July 20, 2017
Filing Date:
January 12, 2016
Export Citation:
Assignee:
EBARA CORP
International Classes:
H01L21/304; B24B37/00; B24B57/02
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Hiroyuki Ohno
Koji Morita
Osamu Tsuda
Matsuno Chihiro
Seiichi Sakitani
Tsukuda Seigen
Hiroshi Nomoto
Kobayashi Hideyoshi
Hiroyuki Ohno
Koji Morita
Osamu Tsuda
Matsuno Chihiro
Seiichi Sakitani
Tsukuda Seigen
Hiroshi Nomoto
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