To provide a liquid control device capable of accurately monitoring a vaporization process of liquid while maintaining responsiveness in temperature control.
A liquid control device 10 controls spreading and vaporization of a chemical. The liquid control device 10 includes a body 31 having an upper surface 31c supplied with the chemical, a mesh having a minute structure for promoting spreading of the chemical, and a heater 80 for heating the upper surface 31c from inside of the body 31. In the spreading direction of the upper surface 31c, the liquid control device 10 includes: a first temperature sensor 83 for detecting temperature of a first part inside the body 31 between the supplied position and the heater 80; a second temperature sensor 84 for detecting temperature of a second part inside the body 31 on the opposite side of the first part sandwiching the supplied position between the first/second parts; and a controller 70 controlling a heat generation amount of the heater 80 based on the temperature of the first part and executing a predetermined monitoring processing based on the temperature of the second part.
BANDO HIROSHI
JPWO2011040067A1 | 2013-02-21 | |||
JP2011097088A | 2011-05-12 | |||
JP2005057193A | 2005-03-03 | |||
JPH0747201A | 1995-02-21 | |||
JPH11500659A | 1999-01-19 | |||
JPH06232035A | 1994-08-19 | |||
JP2009194246A | 2009-08-27 | |||
JPH07155584A | 1995-06-20 | |||
JP2004363562A | 2004-12-24 | |||
JP2008263244A | 2008-10-30 | |||
JPWO2011040067A1 | 2013-02-21 | |||
JP2011097088A | 2011-05-12 | |||
JP2005057193A | 2005-03-03 | |||
JPH0747201A | 1995-02-21 | |||
JPH11500659A | 1999-01-19 | |||
JPH06232035A | 1994-08-19 | |||
JP2009194246A | 2009-08-27 | |||
JPH07155584A | 1995-06-20 | |||
JP2004363562A | 2004-12-24 | |||
JP2008263244A | 2008-10-30 |
GB1439603A | 1976-06-16 | |||
GB1439603A | 1976-06-16 |
Hiroshi Matsuda
Next Patent: WATER PROCESSING DEVICE