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Patent Searching and Data


Title:
LIQUID IMMERSION EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2008160101
Kind Code:
A
Abstract:

To provide a liquid immersion exposure apparatus capable of suppressing deterioration in performance due to a cover member in exposing a substrate via a liquid.

The liquid immersion exposure apparatus is provided with a first optical member having an exit surface via which an exposure beam is emitted; a first movable body movable with respect to the first optical member while holding a substrate; a cover member movable with movement of the first movable body and capable of retaining a liquid in a space formed between the exit surface and the cover member when it is at a position opposite to the exit surface; a first holding section provided on the first movable body and holding the cover member; and a transport section for removing the cover member from the first holding section and moving the cover member independent of the first movable body.


Inventors:
KIUCHI TORU
Application Number:
JP2007310931A
Publication Date:
July 10, 2008
Filing Date:
November 30, 2007
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G03F7/20
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi