Title:
LIQUID JET DEVICE, AND MAINTENANCE METHOD FOR LIQUID JET DEVICE
Document Type and Number:
Japanese Patent JP2021123086
Kind Code:
A
Abstract:
To provide a liquid jet device, and a maintenance method for the liquid jet device that can reduce the time increasing when wiping a nozzle surface multiple times.SOLUTION: A liquid jet device includes: a liquid jet part 20 capable of jetting a liquid from nozzles 36 arranged on a nozzle surface; a wiping mechanism 43 capable of executing a wiping operation for wiping the nozzle surface, by relatively moving a strip member 60 capable of absorbing the liquid jetted by the liquid jet part 20, with respect to the nozzle surface, in a state of contacting the nozzle surface; and a control part for carrying out a pre-wiping operation of making the strip member relatively move with respect to the nozzle surface at a higher speed than during the relative movement at the time of the wiping operation, in a state that the strip member 60 is in non-contact with the nozzle surface and capable of contacting the liquid adhering to the nozzle surface, before the wiping operation for wiping the nozzle surface with the strip member 60.SELECTED DRAWING: Figure 3
Inventors:
MURAYAMA MASATO
YOSHIDA ATSUSHI
MATSUOKA HIROKI
ARAFUKA KAZUSHI
YOSHIDA ATSUSHI
MATSUOKA HIROKI
ARAFUKA KAZUSHI
Application Number:
JP2020020369A
Publication Date:
August 30, 2021
Filing Date:
February 10, 2020
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
B41J2/165
Attorney, Agent or Firm:
Kazuaki Watanabe
Satoshi Nakai
Hiroki Matsuoka
Satoshi Nakai
Hiroki Matsuoka