Title:
液体金属イオン源、二次粒子質量分析計および二次粒子質量分析方法
Document Type and Number:
Japanese Patent JP5611046
Kind Code:
B2
Abstract:
Liquid metal ion source comprises bismuth in an alloy containing an other metal with an atomic weight of = 90 u, a solubility in bismuth of >= 1%, with few or no isotopes and/or any narrow isotopic arrangement and during the ion beam production none or only small amount of mixed clusters with bismuth forms. Independent claims are included for: (1) a secondary particle mass spectrometer for the analysis of secondary particles such as secondary ions and/or post-ionized neutral secondary particles with a liquid metal ion source for the generation of a primary ion beam for the irradiation of a sample and generation of secondary particles, which exhibit the liquid metal ion source as well as primary ion beam emitted from the liquid metal ion source with a filter device and one of several types of bismuth ion, whose mass amounts to a multiple of the monoatomic, singly or multiply charged bismuth ions, is to be filtered out in the form of a mass-pure primary ion beam, when one of several types of ion of the other metal are filterable as mass-pure filtered primary ion beam; and (2) a secondary particle mass spectrometric analysis method for the analysis of a sample, where the surface of the sample is irradiated with a primary ion beam, and a primary ion beam is generated, where: the beam contains monoatomic or polyatomic ions of a first metal and monoatomic ions of an other metal; the ions of the first metal exhibit an atomic weight of >= 190 u and the ions of the other metal exhibit an atomic weight of >= 90 u, alternately from the primary ion beam on the one hand, one of several types of ion of the first metal filtered as mass-pure primary ion beam and on the other hand one of several types of ion of the other metal filtered as mass-pure primary ion beam, are filtered out, and the secondary particle spectrum containing primary ion beam filtered with the ions of the first metal and the secondary particle spectrum containing primary ion beam filtered with the ions of the other metal are determined.
Inventors:
コルマー、フェリックス
ヘルスター、ペーター
ダッティング、アンドレアス
ヘルスター、ペーター
ダッティング、アンドレアス
Application Number:
JP2010530313A
Publication Date:
October 22, 2014
Filing Date:
October 16, 2008
Export Citation:
Assignee:
イオン−トフ テクノロジーズ ゲーエムベーハー
International Classes:
H01J27/26; H01J37/252; H01J37/317; H01J49/26; H01J49/40
Attorney, Agent or Firm:
Ryuka international patent business corporation