To provide a liquid application mechanism capable of removing a foreign substance from a coating liquid.
The liquid application mechanism has a liquid application means for applying a supplied liquid on an application medium and a liquid supply means that supplies the liquid to the liquid application means. The liquid supply means makes the liquid in a storage unit 3002 flow out from an outlet 3402 of the storage unit 3002 and supplies the liquid to the liquid application means. The liquid supply means, simultaneously, makes the liquid which has not been applied to the application medium by the liquid application means of the liquid fed to the liquid application means flow in from an inlet 3404 of the storage unit 3002 and returns to the storage unit 3002. At a bottom portion of the storage unit 3002, a plurality of trap space sections 3501 separated from each other by ribs 3502 are formed. The trap space section 3501 have continuous rectangular shapes, and are open upward in the gravity direction. The rib height of the trap space sections 3501 is equal to or greater than 3 mm, and the rib interval of the trap space sections 3501 is in the range from ≥2 mm to ≤10 mm.
HAMANO TORU
YOSHIKAWA JUNICHI
| JP2006095883A | 2006-04-13 | |||
| JP2007044649A | 2007-02-22 | |||
| JP2007044876A | 2007-02-22 |
Sogo Kuroiwa
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