To provide a small-footprint and low-cost liquid supply system stably supplying liquid, in which gas in the liquid is foamed and removed, to a discharge destination from a tank storing the liquid through alternate pressure feed by a pair of pumps.
A chemical supply system 1 includes a deaeration device 50 having: a supply port 53 supplying a chemical from a chemical supply source; a storage tank 50T temporarily storing the chemical flowing in from the supply port 53; a discharge port 62 discharging the chemical from a lower part of the storage tank 50T; and an exhaust port 54 exhausting bubbles foamed from the chemical to the outside of the tank 50T through an upper part of the storage tank 50T. The deaeration device 50 is arranged in first and second chemical suction pipe lines Li1, Li2 between the chemical supply source and the bellows pumps 10 and is provided with a cavitation nozzle 70 at the supply port 53. The two bellows pumps 10 are provided side by side in parallel in the second chemical suction pipe line Li2 connected to the discharge port 63 of the deaeration device 50.
| JP3931048 | PUMP FOR SEMICONDUCTOR MANUFACTURING DEVICE |
| WO/2012/005015 | DRUG SOLUTION DISPENSING DEVICE |
| WO/2017/025276 | PUMP SYSTEM |
NISHIGAKI MIDORI
OSUGI SHIGERU
| JP2000097157A | 2000-04-04 | |||
| JPH1162838A | 1999-03-05 | |||
| JP2004245527A | 2004-09-02 |