Liquid treatment devices and a liquid treating method - 東京エレクトロン株式会社

Title:

Liquid treatment devices and a liquid treating method

Document Type and Number:

Japanese Patent JP5951377

Kind Code:

B2

Abstract:

A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.

Inventors:

Aiura Kazuhiro
Norihiro Ito
Takashi Nagai

Application Number:

JP2012155625A

Publication Date:

July 13, 2016

Filing Date:

July 11, 2012

Export Citation:

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