Title:
液処理装置
Document Type and Number:
Japanese Patent JP4949338
Kind Code:
B2
Abstract:
Disclosed is a liquid treatment apparatus capable of effectively exhausting processing liquid atmosphere around a target object. The liquid treatment apparatus includes a container, a support part located within the container that supports the target object, a rotation driving mechanism to rotate the target object supported by the support part, a processing liquid supply mechanism to supply a processing liquid to the target object, and a rotation cup, which is located outside of the outer circumference of the target object and is rotatable together with the support part. A rotation exhaust cup is arranged above the rotation cup and is rotatable together with the rotation cup. A discharge mechanism discharges processing liquid atmosphere guided by the rotation cup and the rotation exhaust cup.
Inventors:
Norihiro Ito
Takeshi Ara
Takeshi Ara
Application Number:
JP2008203401A
Publication Date:
June 06, 2012
Filing Date:
August 06, 2008
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304; H01L21/027; H01L21/306
Domestic Patent References:
| JP2000097564A | ||||
| JP11087225A | ||||
| JP9148231A |
Foreign References:
| WO2008013118A1 |
Attorney, Agent or Firm:
Kenji Yoshitake
Hiroyuki Nagai
Junpei Okada
Hirohito Katsunuma
Hiroyuki Ohno
Hiroyuki Nagai
Junpei Okada
Hirohito Katsunuma
Hiroyuki Ohno