Title:
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2005079584
Kind Code:
A
Abstract:
To provide a lithographic projection apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system.
The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of an immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced.
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Inventors:
DIERICHS MARCEL MATHIJS THEODO
DONDERS SJOERD NICOLAAS LAMBER
JACOBS JOHANNES HENRICUS WILHE
JANSEN HANS
LOOPSTRA ERIK ROELOF
JEROEN JOHANNES SOPHIA MARIA M
STAVENGA MARCO KOERT
STREEFKERK BOB
VERHAGEN MARTINUS CORNELIS MAR
SEUNTIENS-GRUDA LEJLA
DONDERS SJOERD NICOLAAS LAMBER
JACOBS JOHANNES HENRICUS WILHE
JANSEN HANS
LOOPSTRA ERIK ROELOF
JEROEN JOHANNES SOPHIA MARIA M
STAVENGA MARCO KOERT
STREEFKERK BOB
VERHAGEN MARTINUS CORNELIS MAR
SEUNTIENS-GRUDA LEJLA
Application Number:
JP2004247635A
Publication Date:
March 24, 2005
Filing Date:
August 27, 2004
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
B01D61/02; B01D61/24; G03F7/20; H01L21/027; C02F1/04; C02F1/28; C02F1/32; C02F1/42; C02F1/44; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Toru Mori
Yukio Iwamoto
Hajime Asamura
Toru Mori
Yukio Iwamoto