Title:
LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND OPTICAL ELEMENT FOR ROTATING INTENSITY DISTRIBUTION
Document Type and Number:
Japanese Patent JP2005294845
Kind Code:
A
Abstract:
To provide a lithographic apparatus, an illumination system, and an optical element for rotating an intensity distribution.
A lithography projection apparatus includes an illumination system having a reflection type integrator with rectangular cross section. An optical element for re-distributing an intensity distribution emitted from the reflection type integrator is provided.
Inventors:
MULDER HEINE MELLE
BOTMA HAKO
BOTMA HAKO
Application Number:
JP2005105743A
Publication Date:
October 20, 2005
Filing Date:
April 01, 2005
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
G02B19/00; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Katsunori Shirae
Yutaka Yoshida
Hajime Asamura
Katsunori Shirae
Yutaka Yoshida