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Title:
LITHOGRAPHIC APPARATUS AND METHOD OF ILLUMINATION UNIFORMITY CORRECTION AND UNIFORMITY DRIFT COMPENSATION
Document Type and Number:
Japanese Patent JP2010278443
Kind Code:
A
Abstract:

To provide a lithographic apparatus with a uniformity collection system.

A system finger is movably configured so that it can be moved to the inside or outside of the intersection with a radiation beam to correct the intensity of respective parts of the radiation beam. The system includes a working device that is configured to be combined with a corresponding finger in the fingers to move the corresponding finger. The width of the tip of each finger is about a half of that of the working device.


Inventors:
ZIMMERMAN RICHARD CARL
VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE
KOCHERSPERGER PETER C
DOWNEY TODD R
STONE ELIZABETH
CSISZAR SZILARD ISTVAN
KUBICK FREDERICK
VLADIMIRSKY OLGA
Application Number:
JP2010122493A
Publication Date:
December 09, 2010
Filing Date:
May 28, 2010
Export Citation:
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Assignee:
ASML HOLDING NV
ASML NETHERLANDS BV
International Classes:
H01L21/027; G02B19/00
Domestic Patent References:
JP2006253186A2006-09-21
JP2007207821A2007-08-16
JPH11288874A1999-10-19
JP2006253186A2006-09-21
JP2007207821A2007-08-16
Foreign References:
WO2007145139A12007-12-21
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki