Title:
LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2015065482
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.SOLUTION: A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply heat energy to and/or remove heat energy from the support section. The regulation system comprises a plurality of regulation units that are independently controllable.
Inventors:
KUNEN JOHANN GERTRUDIX CORNELIS
JOHANNES HENRICUS WILHELMUS JACOBS
VERSPAGET COEN CORNELIS WILHELMUS
VAN DER HAM RONALD
THOMAS IVO ADAM JOHANNES
HOUBEN MARTIJN
LAURENT THIBAUD SIMON MATTHEW
GREGORY MARTIN MASON CORCORAN
BLOKS RUUD HENDRIKUS MARTINUS JOHANNES
GERBEN PETERS
GUNTHER PIETER LEIN JOSEPH
REMIE MARINUS JAN
SANDER CATHARINA REINIER DERKS
JOHANNES HENRICUS WILHELMUS JACOBS
VERSPAGET COEN CORNELIS WILHELMUS
VAN DER HAM RONALD
THOMAS IVO ADAM JOHANNES
HOUBEN MARTIJN
LAURENT THIBAUD SIMON MATTHEW
GREGORY MARTIN MASON CORCORAN
BLOKS RUUD HENDRIKUS MARTINUS JOHANNES
GERBEN PETERS
GUNTHER PIETER LEIN JOSEPH
REMIE MARINUS JAN
SANDER CATHARINA REINIER DERKS
Application Number:
JP2015003993A
Publication Date:
April 09, 2015
Filing Date:
January 13, 2015
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
H01L21/027; G02B19/00; G03F7/20; H01L21/683
Domestic Patent References:
| JP2008262963A | 2008-10-30 | |||
| JP2009272631A | 2009-11-19 | |||
| JP2005197447A | 2005-07-21 | |||
| JP2009105443A | 2009-05-14 | |||
| JPH0653298A | 1994-02-25 | |||
| JP2008262963A | 2008-10-30 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki