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Title:
LITHOGRAPHIC PRINTING METHOD USING REUSABLE SUBSTRATE
Document Type and Number:
Japanese Patent JP2002160344
Kind Code:
A
Abstract:

To provide a lithographic printing method including a step capable of effectively removing an ink-receptive area of a print master and reusing a substrate in a following printing cycle, and a printing method capable of using a cleaning liquid containing a low content of organic volatile materials to avoid environmental pollution.

An ink-receptive area of a lithographic print master making a lithographic substrate of the print master reusable is removed, and the method preferably includes a step applying a cleaning liquid for the print master. The cleaning liquid is an aqueous emulsion of an organic compound, and also contains a compound shown by a formula (1), wherein X is OH, O- or a polymeric structure.


Inventors:
VERSCHUEREN ERIC
VERMEERSCH JOAN
Application Number:
JP2001277939A
Publication Date:
June 04, 2002
Filing Date:
September 13, 2001
Export Citation:
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Assignee:
AGFA GEVAERT NV
International Classes:
B41C1/10; B41M5/36; B41N3/00; B41N3/06; C11D1/72; C11D3/02; C11D3/06; C11D3/18; C11D3/20; C11D3/36; C11D3/37; C11D3/43; C11D17/00; C11D17/08; G03F7/00; G03F7/42; C11D7/24; C11D7/26; (IPC1-7): B41C1/10; B41N3/06; C11D1/72; C11D3/06; C11D3/36; C11D3/37; C11D3/43; C11D17/08; G03F7/00
Attorney, Agent or Firm:
Heiyoshi Odashima