Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
LITHOGRAPHIC PRINTING WITH POLARIZED LIGHT
Document Type and Number:
Japanese Patent JP2008258637
Kind Code:
A
Abstract:

To provide systems and methods for improved lithographic printing with a polarized light.

Polarized light (polarized in radial or tangential direction) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can also be used. In another embodiment, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask may be a half-tone type PSM or a binary mask. A very high image quality is obtained, even when printing contact holes by using various pitches of low k applications.


Inventors:
BABA-ALI NABILA
KREUZER JUSTIN
SEWELL HARRY
Application Number:
JP2008111552A
Publication Date:
October 23, 2008
Filing Date:
April 22, 2008
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ASML HOLDING NV
International Classes:
H01L21/027; G02B19/00; G03B27/54; G03B27/72; G03C5/00; G03F7/20; G03F9/00; G03F
Domestic Patent References:
JP2006511967A2006-04-06
JPH0794399A1995-04-07
JPH09160219A1997-06-20
JPH0590128A1993-04-09
JPH11191532A1999-07-13
JPH07122469A1995-05-12
JP2006135346A2006-05-25
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki