Title:
LITHOGRAPHIC PRINTING WITH POLARIZED LIGHT
Document Type and Number:
Japanese Patent JP2008258637
Kind Code:
A
Abstract:
To provide systems and methods for improved lithographic printing with a polarized light.
Polarized light (polarized in radial or tangential direction) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can also be used. In another embodiment, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask may be a half-tone type PSM or a binary mask. A very high image quality is obtained, even when printing contact holes by using various pitches of low k applications.
Inventors:
BABA-ALI NABILA
KREUZER JUSTIN
SEWELL HARRY
KREUZER JUSTIN
SEWELL HARRY
Application Number:
JP2008111552A
Publication Date:
October 23, 2008
Filing Date:
April 22, 2008
Export Citation:
Assignee:
ASML HOLDING NV
International Classes:
H01L21/027; G02B19/00; G03B27/54; G03B27/72; G03C5/00; G03F7/20; G03F9/00; G03F
Domestic Patent References:
JP2006511967A | 2006-04-06 | |||
JPH0794399A | 1995-04-07 | |||
JPH09160219A | 1997-06-20 | |||
JPH0590128A | 1993-04-09 | |||
JPH11191532A | 1999-07-13 | |||
JPH07122469A | 1995-05-12 | |||
JP2006135346A | 2006-05-25 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki
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