Title:
LITHOGRAPHIC PROJECTION APPARATUS AND METHOD FOR MANUFACTURING DEVICE USING IT
Document Type and Number:
Japanese Patent JP3931039
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an improved projection apparatus having positioning system capable of accurately arranging a reflective optical element such as a mirror superior as the wavelength of the beam of radiation becomes short and requiring more accurate arrangement than a refracting optical element in terms of convergence and control of beam of radiation of lithographic projection apparatus.
SOLUTION: Position of a mirror 10 in the projected beam PB of radiation is measured by use of absolute position sensors 41 and 42, and then variation of the position is measured by use of relative position sensors 43 and 44. The position of the mirror 10 is controlled by a controller 50 and drive means 30 in accordance with the value measured. The use of both sensors makes the positioning system 20 possible to accurately arrange or stabilize the mirror 10 in failures of redundant calibration or initialization of the mirror 10 to cancel any vibration of the mirror 10.
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Inventors:
Erik Roelov Ropestra
Antonius Johannes Josephus Bandisi Gisseldonk
Antonius Johannes Josephus Bandisi Gisseldonk
Application Number:
JP2000403605A
Publication Date:
June 13, 2007
Filing Date:
November 28, 2000
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G01B21/00; G01B21/22; H01L21/027; G02B7/198; G03F7/20; G03F9/00; (IPC1-7): H01L21/027; G01B21/00; G01B21/22; G02B7/198; G03F9/00
Domestic Patent References:
| JP5343283A | ||||
| JP3283420A | ||||
| JP3022407A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Hideto Asamura
Hajime Asamura
Yutaka Yoshida
Yukio Iwamoto
Shinji Oga
Toshifumi Onuki
Hideto Asamura
Hajime Asamura
Yutaka Yoshida
Yukio Iwamoto