Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
LITHOGRAPHIC PROJECTOR
Document Type and Number:
Japanese Patent JP3842480
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a scan type lithographic projector usable for manufacturing ICs, etc., wherein the exposure error of the projector occurs at the start and end of scan due to the reflection from a reticle mask blade and hence this is improved to make the slit illumination const. and uniform over the entire scan.
SOLUTION: A controller 11 controls the opening-closing of a slit defined by a reticle mask blade 7. A part of light beam emitted from a light source 1 is picked up and detected by a sensor 6 and a lamp controller 10 adjusts so that the illumination intensity of the slit is const. The controllers 10, 11 are interlocked to compensate the illumination intensity increase when the mask blade 7 opens. The mask blade 7 is made of a transparent material and provided with a total reflector at the top end or a reflective film on the back surface to prevent the reflection to a reticle 8.


Inventors:
Van der rey schwe Abraham Hartmann
Dreuve Lart Willem
Bonema Guerrito Marten
Wilhelms Maria Corbeil
Application Number:
JP10407899A
Publication Date:
November 08, 2006
Filing Date:
April 12, 1999
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
IS M Lithography Besloten Fuennaught Shap
International Classes:
H01L21/027; G03F7/20; G03F7/23; (IPC1-7): H01L21/027; G03F7/23
Domestic Patent References:
JP10083953A
JP8255738A
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yukio Iwamoto
Toru Mori