Title:
リソグラフィ走査露光投影装置
Document Type and Number:
Japanese Patent JP3813635
Kind Code:
B2
Abstract:
A lithographic scanning exposure projection apparatus is provided with a radiation source (1) providing radiation pulses, a lens system (3, 7), a mask (5), imaged onto a substrate (9) and scanning apparatus (10) for scanning an image of an exit window (2) of the radiation source at a scanning speed over the substrate (9). A controller (13) controls both the energy of the radiation pulses and the scanning speed in dependence on the required exposure dose on the substrate and the repetition rate of the radiation pulses. The controller ensures maximum throughput of substrates through the apparatus and a minimum dose non-uniformity on the substrates.
Inventors:
Strawer Alexander
Dayager Ronald Andre Maria
Dayager Ronald Andre Maria
Application Number:
JP53508297A
Publication Date:
August 23, 2006
Filing Date:
March 25, 1997
Export Citation:
Assignee:
AJMEL Netherlands Lands Beth Rotten Fuennaught Shap
International Classes:
G03F7/22; G03F7/20; H01L21/027
Domestic Patent References:
| JP6267826A | ||||
| JP6260384A | ||||
| JP1257327A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yukio Iwamoto
Toru Mori
Hajime Asamura
Yukio Iwamoto
Toru Mori