Title:
LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP3662571
Kind Code:
B
Abstract:
PROBLEM TO BE SOLVED: To provide an optical element having a long life including a multiple optical layer mirror for a lithography projecting apparatus employing extreme ultraviolet rays (EUV) as the projection beam.
SOLUTION: In a multiple optical layer optical element of a lithography projecting apparatus, at least one optical layer is constructed with an alloy of Mo and Cr. The layer can form the outermost layer of an MO/Si layer having an arbitrary protective outside layer of Ru. Further, the multiple optical layer optical element can be constructed with a plurality of layers put between Mo/Cr alloy layers.
Inventors:
Kurt, Ralph
Application Number:
JP2003000193930
Publication Date:
April 01, 2005
Filing Date:
June 04, 2003
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
G02B1/10; G02B1/11; G02B5/08; G02B5/26; G02B5/28; G03F7/20; G21K1/06; G21K5/00; G21K5/02; H01L21/027; (IPC1-7): H01L21/027; G02B5/08; G02B5/26; G02B5/28; G03F7/20; G21K1/06; G21K5/00; G21K5/02
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