Title:
LITHOGRAPHY APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED BY THE SAME METHOD
Document Type and Number:
Japanese Patent JP3831692
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a bellows for a lithography device which can separate torsional vibrations, force or moments.
SOLUTION: The bellows for use in connecting two airtight regions of the lithography device or connecting a region and a pump has a first region having a smooth spiral undulation and a second region capable of absorbing movement in the vertical direction caused by the relative rotation of ends of the first region. The second region can be used as an mirror image of the first region, one of circumferential undulations or as a plurality of subregions.
Inventors:
Nicolas Rudolph Kempel
Hernes Jacobs
Edwin Johann Buis
Hernes Jacobs
Edwin Johann Buis
Application Number:
JP2002235856A
Publication Date:
October 11, 2006
Filing Date:
August 13, 2002
Export Citation:
Assignee:
AJMEL Netherlands Lands Beth Rotten Fuennaught Shap
International Classes:
H01L21/027; F16J3/04; F16L11/15; G03F7/20; (IPC1-7): H01L21/027
Domestic Patent References:
| JP7055003A | ||||
| JP4151088A | ||||
| JP62118163A | ||||
| JP5272674A | ||||
| JP60053274A | ||||
| JP11294658A | ||||
| JP57076362A |
Foreign References:
| WO2000074120A1 |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Toru Mori
Yutaka Yoshida
Hajime Asamura
Toru Mori
Yutaka Yoshida
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