Title:
Lithography device
Document Type and Number:
Japanese Patent JP5987042
Kind Code:
B2
Abstract:
A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
Inventors:
Theodorus Marineus Modderman
Application Number:
JP2014235437A
Publication Date:
September 06, 2016
Filing Date:
November 20, 2014
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L21/68
Domestic Patent References:
| JP2006135165A | ||||
| JP2006074961A | ||||
| JP2004259966A | ||||
| JP2004342638A | ||||
| JP2006523377A |
Attorney, Agent or Firm:
Sakaki Morishita
Takeshi Aoki
Takeshi Aoki