Title:
リソグラフィ装置およびリソグラフィ装置の冷却方法
Document Type and Number:
Japanese Patent JP5214771
Kind Code:
B2
Abstract:
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a cooling system to cool a part of the lithographic apparatus with increased cooling capabilities to reduce the heat transfer from the part to other parts of the apparatus.
Inventors:
Schult Nicolas Rambertus Dondels
Application Number:
JP2011136994A
Publication Date:
June 19, 2013
Filing Date:
June 21, 2011
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20; H01L21/683
Domestic Patent References:
| JP2005026288A | ||||
| JP2001290543A | ||||
| JP8293449A | ||||
| JP2004357426A | ||||
| JP2004247462A | ||||
| JP2004159493A | ||||
| JP11122900A | ||||
| JP11312632A | ||||
| JP2002141287A |
Foreign References:
| WO2003079418A1 | ||||
| WO1999041778A1 |
Attorney, Agent or Firm:
Sakaki Morishita