Title:
リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4304169
Kind Code:
B2
Abstract:
A device manufacturing method for a substrate of a batch of substrates includes conveying the substrate to an exposing position of a lithographic apparatus, exposing the substrate at the exposing position to a beam of radiation of the lithographic apparatus, and conveying the exposed substrate from the exposing position toward a processing position configured to process the exposed substrate, wherein a start time for the exposing of the substrate is varied so as to control that a time interval between the end of the exposing of the substrate at the exposing position and the start of processing of the substrate at the processing position for the substrate is substantially the same as for each other substrate in the batch of substrates.
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Inventors:
Lviv Valer Laurea
Application Number:
JP2005151957A
Publication Date:
July 29, 2009
Filing Date:
May 25, 2005
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03B27/00; G03C5/00; G03F7/20
Domestic Patent References:
JP8316130A | ||||
JP4239720A |
Attorney, Agent or Firm:
Sakaki Morishita