LITHOGRAPHY EQUIPMENT AND DEVICE MANUFACTURE METHOD

Title:

LITHOGRAPHY EQUIPMENT AND DEVICE MANUFACTURE METHOD

Document Type and Number:

Japanese Patent JP2006191079

Kind Code:

A

Abstract:

To provide the method of correcting the exposure parameter of immersion type lithography equipment, and/or a computer program product.

The invention is the method of correcting the exposure parameter of immersion type lithography equipment. In this method, exposure parameter is measured using measuring beam projected via liquid between the projection system of the immersion type lithography equipment and a substrate table. Offset is searched for based on variation in physical property which affects measurement carried out using the measuring beam. Measured exposure parameter is corrected partially at least. There are provided the equipment and the method for measuring the height of an optical element connected to liquid between the projection system of the immersion type lithography equipment and the substrate table.

More Like This:

JPH01154064	FORMING METHOD FOR MINUTE PATTERN
WO/1999/067683	OPTICAL SYSTEM, ESPECIALLY A PROJECTION LIGHT FACILITY FOR MICROLITHOGRAPHY

Inventors:

BASELMANS JOHANNES JACOBUS MAT
DONDERS SJOERD NICOLAAS LAMBER
CHRISTIAAN ALEXANDER HOOGENDAM
MERTENS JEROEN JOHANNES SOPHIA
MULKENS JOHANNES CATHARINUS HU
STREEFKERK BOB

Application Number:

JP2005376924A

Publication Date:

July 20, 2006

Filing Date:

December 28, 2005

Export Citation:

Click for automatic bibliography generation Help

Assignee:

ASML NETHERLANDS BV

International Classes:

H01L21/027; G03F7/20

Attorney, Agent or Firm:

Hideto Asamura
Hajime Asamura
Yutaka Yoshida
Toru Mori

Previous Patent: JP2006191078

Next Patent: IMAGE SENSOR IN WHICH LIGHT RECEIVING REGION IS EXTENDED AND METHOD OF MANUFACTURING THE SAME