Title:
リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4154380
Kind Code:
B2
Abstract:
The invention relates to a lithographic apparatus (1) including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a particle-tight storage container (4) defining a storage space for storing patterning structures (8), wherein the storage container (4) is arranged to be coupled with a transfer container (6) such that the transfer container (6) for exchanging patterning structures (8) between the transfer container (6) and the lithographic apparatus (1) through a closeable passage (26) between the transfer container (6) and the storage container (4), a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. Furthermore, the invention relates to a method of using such an apparatus.
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Inventors:
Bastien Rambertus Wilhelms Marin van Defen
Eric Leonardus Ham
Eric Leonardus Ham
Application Number:
JP2004282006A
Publication Date:
September 24, 2008
Filing Date:
September 28, 2004
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; B65G49/00; G03F7/20; H01L21/677
Domestic Patent References:
| JP2002158155A | ||||
| JP11054400A |
Foreign References:
| WO2002093626A1 | ||||
| WO2003013993A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki