Title:
リソグラフィ装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP4387975
Kind Code:
B2
Abstract:
A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.
Inventors:
Fadim Jefgen Jefici Banine
Refinus Peter Baker
Jerone, Yonkers
Eric Roeloff Rope Stra
Refinus Peter Baker
Jerone, Yonkers
Eric Roeloff Rope Stra
Application Number:
JP2005129262A
Publication Date:
December 24, 2009
Filing Date:
April 27, 2005
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G02B5/08; H01L21/027; G03B27/54; G03F7/20
Domestic Patent References:
| JP2000294491A | ||||
| JP61097831A | ||||
| JP2007527117A | ||||
| JP9148658A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki