Title:
リソグラフィ装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP4545119
Kind Code:
B2
Abstract:
An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
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| JPS598332 | SHIFTER FOR SAMPLE |
Inventors:
Bob Strefkerk
Schult Nicolas Rambertus Dondels
Martinus Hendricks Antonius Rendels
Schult Nicolas Rambertus Dondels
Martinus Hendricks Antonius Rendels
Application Number:
JP2006176047A
Publication Date:
September 15, 2010
Filing Date:
June 27, 2006
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2005136404A | ||||
| JP2006140499A | ||||
| JP2004172621A | ||||
| JP2005079589A |
Foreign References:
| WO2004092830A1 | ||||
| WO2005119742A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki