To provide lithography equipment capable of supplying a liquid having a high index of refraction to a space between a final lens element and a substrate and reducing distortion of the substrate.
The lithography equipment comprises a lighting system for providing a projection beam of radiation; a support structure for supporting a pattern forming device that gives a pattern to the cross-section of the projection beams; a substrate table for supporting the substrate, having a bur plate and a vacuum system for establishing a pressure difference across the entire substrate held by the bur plate, in which the pressure difference is larger at the circumferential part of the substrate than the central part; a projection system for projecting the pattern-formed beam onto the target part of the substrate; and a liquid supply system for supplying a liquid having a high index of refraction to a space between the final element of the projection system and the substrate held by the substrate table, wherein the density of the bur on the bur plate is higher at the circumferential part than the central part.
JEROEN JOHANNES SOPHIA MARIA M
OTTENS JOOST JEROEN
| JPH1050810A | 1998-02-20 | |||
| JP2001060617A | 2001-03-06 | |||
| JP2003249542A | 2003-09-05 | |||
| JP2001127145A | 2001-05-11 | |||
| JPH10303114A | 1998-11-13 | |||
| JPH10233433A | 1998-09-02 | |||
| JPH06168866A | 1994-06-14 | |||
| JPH06124873A | 1994-05-06 | |||
| JPH10340846A | 1998-12-22 |
Hajime Asamura
Yutaka Yoshida
Yukio Iwamoto
Next Patent: LITHOGRAPHY EQUIPMENT, METHOD FOR MANUFACTURING DEVICE, AND DEVICE MANUFACTURED BY THE METHOD