Title:
リソグラフィ装置及び汚染物を除去する方法
Document Type and Number:
Japanese Patent JP5230588
Kind Code:
B2
Abstract:
A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.
Inventors:
Van der hayden, marx, theodore, wilhelms
Boelema, Mark, Drebeth
Rume, Matthias
Putts, Mario
Boelema, Mark, Drebeth
Rume, Matthias
Putts, Mario
Application Number:
JP2009270949A
Publication Date:
July 10, 2013
Filing Date:
November 30, 2009
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; B08B3/04; B08B9/22; G03F7/20
Domestic Patent References:
| JP2004063669A | ||||
| JP2007103658A | ||||
| JP2006064495A | ||||
| JP2006187680A | ||||
| JP2010103363A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki
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