Title:
リソグラフィ機器、放射システム、汚染物質トラップ、デバイスの製造方法、及び汚染物質トラップ内で汚染物質を捕らえる方法
Document Type and Number:
Japanese Patent JP4391453
Kind Code:
B2
Abstract:
A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
Inventors:
Levinus Peter Baker
Vadim Jebgenjevic Banine
Cornelis Petrus Andreas Marie Louis Yux
Frank Jerone Peter Surmans
Vadim Jebgenjevic Banine
Cornelis Petrus Andreas Marie Louis Yux
Frank Jerone Peter Surmans
Application Number:
JP2005233742A
Publication Date:
December 24, 2009
Filing Date:
July 14, 2005
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20; G21K1/00; G21K5/02
Domestic Patent References:
| JP2004501491A | ||||
| JP2004340761A | ||||
| JP2002504746A | ||||
| JP2003007611A | ||||
| JP2005505945A |
Foreign References:
| WO2003034153A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki