Title:
リソグラフィ装置
Document Type and Number:
Japanese Patent JP4347398
Kind Code:
B2
Abstract:
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
Inventors:
Christian alexander hogendam
Bob Strefkerk
Johannes Catherine Hubertus Mulkens
Eric Theodorus Maria Biulart
Alexey Yury Fich Kolesnie Schenko
Eric Roeloff Rope Stra
Yellow Enchant Johannes Sofia Maria Martens
Bernardus Anthony Slackhecke
Patrices Aloysius Jakobs Tynemans
Helmer van Sant
Bob Strefkerk
Johannes Catherine Hubertus Mulkens
Eric Theodorus Maria Biulart
Alexey Yury Fich Kolesnie Schenko
Eric Roeloff Rope Stra
Yellow Enchant Johannes Sofia Maria Martens
Bernardus Anthony Slackhecke
Patrices Aloysius Jakobs Tynemans
Helmer van Sant
Application Number:
JP2008132385A
Publication Date:
October 21, 2009
Filing Date:
May 20, 2008
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L21/027; B05C11/00; G03B27/42; G03B27/52; H01L21/00
Domestic Patent References:
| JP2004193252A | ||||
| JP10303114A | ||||
| JP2006523026A | ||||
| JP2004356205A | ||||
| JP2005085789A |
Foreign References:
| WO2004090956A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki