Title:
リソグラフィプロセス評価システム、リソグラフィプロセス評価方法、露光装置評価方法、マスクパターン設計方法及び半導体装置の製造方法
Document Type and Number:
Japanese Patent JP4084312
Kind Code:
B2
Abstract:
An exposure system has an exposure tool configured to project images of a grating pattern and a test pattern having an opening onto an identical exposure field on a wafer, a measuring module configured to measure critical dimension variations of the projected grating pattern by setting a position of the projected test pattern as a measurement standard, and a pattern density influence estimator configured to estimate an influence of a pattern density of a mask to be mounted in the exposure tool upon the critical dimension variations.
Inventors:
Kazuya Fukuhara
Application Number:
JP2004009816A
Publication Date:
April 30, 2008
Filing Date:
January 16, 2004
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
G03F7/20; H01L21/027; G03B27/00; G03C5/00; G03F1/36; G03F1/68; G03F9/00; H01L21/00; H01L21/02
Domestic Patent References:
| JP2003100624A | ||||
| JP2002318448A | ||||
| JP2001296646A | ||||
| JP2001272766A | ||||
| JP2001222097A | ||||
| JP2000235945A |
Foreign References:
| WO2005008754A1 |
Attorney, Agent or Firm:
Hidekazu Miyoshi
Iwa Saki Kokuni
Kawamata Sumio
Nakamura Tomoyuki
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu
Iwa Saki Kokuni
Kawamata Sumio
Nakamura Tomoyuki
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu