Title:
リソグラフィシステム
Document Type and Number:
Japanese Patent JP5018088
Kind Code:
B2
Abstract:
Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.
Inventors:
Alton Hugh Phillips
Application Number:
JP2006543953A
Publication Date:
September 05, 2012
Filing Date:
December 06, 2004
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G03F7/20; H01L21/683
Domestic Patent References:
| JP11214482A | ||||
| JP2004165198A |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi
Tadashi Takahashi
Kazuya Nishi