Title:
LOCAL TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2001237225
Kind Code:
A
Abstract:
To provide a local treatment device which can improve the efficiency of surface treatment by stably efficiently causing gas discharge by causing heat exchange by using a refrigerant introduced into the casing.
This local treatment device has an electromagnetic shielding casing member 21, a discharge tube 40 through which a process gas is made flow in the member 21, and a pair of electrodes 46 and 48 which are faced oppositely to each other on both sides of the tube 40. The treatment device also has a lead 30 which connects one electrode 46 to a high-frequency power source, and an air supply pipe 52 and an air discharge pipe 54 laid in the member 21 so that the refrigerant may be supplied into the casing member 21.
Inventors:
MIYAJIMA HIROO
KOIKE TAKASHI
AKIYAMA HIROAKI
KOIKE TAKASHI
AKIYAMA HIROAKI
Application Number:
JP2000046394A
Publication Date:
August 31, 2001
Filing Date:
February 23, 2000
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
C23C16/509; C23F4/00; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/3065; C23C16/509; C23F4/00; H01L21/31
Attorney, Agent or Firm:
Kisaburo Suzuki (2 outside)
Previous Patent: VACUUM-TREATING DEVICE
Next Patent: SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT EQUIPMENT AND DEVICE MANUFACTURING METHOD
Next Patent: SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT EQUIPMENT AND DEVICE MANUFACTURING METHOD